Pulsed laser deposition of air-sensitive hydride epitaxial thin films: LiH

Hiroyuki Oguchi; Shigehito Isobe; Hiroki Kuwano; Susumu Shiraki; Shin Ichi Orimo; Taro Hitosugi

doi:10.1063/1.4931080

Pulsed laser deposition of air-sensitive hydride epitaxial thin films: LiH

Hiroyuki Oguchi, Shigehito Isobe, Hiroki Kuwano, Susumu Shiraki, Shin Ichi Orimo, Taro Hitosugi

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

Abstract

We report on the epitaxial thin film growth of an air-sensitive hydride, lithium hydride (LiH), using pulsed laser deposition (PLD). We first synthesized a dense LiH target, which is key for PLD growth of high-quality hydride films. Then, we obtained epitaxial thin films of [100]-oriented LiH on a MgO(100) substrate at 250°C under a hydrogen pressure of 1.3 × 10^-2 Pa. Atomic force microscopy revealed that the film demonstrates a Stranski-Krastanov growth mode and that the film with a thickness of ∼10 nm has a good surface flatness, with root-mean-square roughness R_RMS of ∼0.4 nm.

Original language	English
Article number	096106
Journal	APL Materials
Volume	3
Issue number	9
DOIs	https://doi.org/10.1063/1.4931080
Publication status	Published - 2015 Sep 1

ASJC Scopus subject areas

Materials Science(all)
Engineering(all)

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title = "Pulsed laser deposition of air-sensitive hydride epitaxial thin films: LiH",

abstract = "We report on the epitaxial thin film growth of an air-sensitive hydride, lithium hydride (LiH), using pulsed laser deposition (PLD). We first synthesized a dense LiH target, which is key for PLD growth of high-quality hydride films. Then, we obtained epitaxial thin films of [100]-oriented LiH on a MgO(100) substrate at 250°C under a hydrogen pressure of 1.3 × 10-2 Pa. Atomic force microscopy revealed that the film demonstrates a Stranski-Krastanov growth mode and that the film with a thickness of ∼10 nm has a good surface flatness, with root-mean-square roughness RRMS of ∼0.4 nm.",

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AU - Oguchi, Hiroyuki

AU - Isobe, Shigehito

AU - Kuwano, Hiroki

AU - Shiraki, Susumu

AU - Orimo, Shin Ichi

AU - Hitosugi, Taro

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N2 - We report on the epitaxial thin film growth of an air-sensitive hydride, lithium hydride (LiH), using pulsed laser deposition (PLD). We first synthesized a dense LiH target, which is key for PLD growth of high-quality hydride films. Then, we obtained epitaxial thin films of [100]-oriented LiH on a MgO(100) substrate at 250°C under a hydrogen pressure of 1.3 × 10-2 Pa. Atomic force microscopy revealed that the film demonstrates a Stranski-Krastanov growth mode and that the film with a thickness of ∼10 nm has a good surface flatness, with root-mean-square roughness RRMS of ∼0.4 nm.

AB - We report on the epitaxial thin film growth of an air-sensitive hydride, lithium hydride (LiH), using pulsed laser deposition (PLD). We first synthesized a dense LiH target, which is key for PLD growth of high-quality hydride films. Then, we obtained epitaxial thin films of [100]-oriented LiH on a MgO(100) substrate at 250°C under a hydrogen pressure of 1.3 × 10-2 Pa. Atomic force microscopy revealed that the film demonstrates a Stranski-Krastanov growth mode and that the film with a thickness of ∼10 nm has a good surface flatness, with root-mean-square roughness RRMS of ∼0.4 nm.

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Pulsed laser deposition of air-sensitive hydride epitaxial thin films: LiH

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