Abstract
We report on the epitaxial thin film growth of an air-sensitive hydride, lithium hydride (LiH), using pulsed laser deposition (PLD). We first synthesized a dense LiH target, which is key for PLD growth of high-quality hydride films. Then, we obtained epitaxial thin films of [100]-oriented LiH on a MgO(100) substrate at 250°C under a hydrogen pressure of 1.3 × 10-2 Pa. Atomic force microscopy revealed that the film demonstrates a Stranski-Krastanov growth mode and that the film with a thickness of ∼10 nm has a good surface flatness, with root-mean-square roughness RRMS of ∼0.4 nm.
| Original language | English |
|---|---|
| Article number | 096106 |
| Journal | APL Materials |
| Volume | 3 |
| Issue number | 9 |
| DOIs | |
| Publication status | Published - 2015 Sep 1 |
ASJC Scopus subject areas
- Materials Science(all)
- Engineering(all)
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Oguchi, H., Isobe, S., Kuwano, H., Shiraki, S., Orimo, S-I., & Hitosugi, T. (2015). Pulsed laser deposition of air-sensitive hydride epitaxial thin films: LiH. APL Materials, 3(9), [096106]. https://doi.org/10.1063/1.4931080