Abstract
We report on the epitaxial thin film growth of an air-sensitive hydride, lithium hydride (LiH), using pulsed laser deposition (PLD). We first synthesized a dense LiH target, which is key for PLD growth of high-quality hydride films. Then, we obtained epitaxial thin films of [100]-oriented LiH on a MgO(100) substrate at 250°C under a hydrogen pressure of 1.3 × 10-2 Pa. Atomic force microscopy revealed that the film demonstrates a Stranski-Krastanov growth mode and that the film with a thickness of ∼10 nm has a good surface flatness, with root-mean-square roughness RRMS of ∼0.4 nm.
Original language | English |
---|---|
Article number | 096106 |
Journal | APL Materials |
Volume | 3 |
Issue number | 9 |
DOIs | |
Publication status | Published - 2015 Sep 1 |
ASJC Scopus subject areas
- Materials Science(all)
- Engineering(all)