Pulse-time-modulated inductively coupled plasma etching for high-performance polysilicon patterning on thin gate oxides

Hiroto Ohtake, Ko Noguchi, Seiji Samukawa, Hidekazu Iida, Arthur Sato, Xue yu Qian

Research output: Contribution to journalArticlepeer-review

18 Citations (Scopus)

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Engineering & Materials Science

Physics & Astronomy