Pt diffusion in B2-type ordered NiAl intermetallic compound and its diffusion mechanisms

Y. Minamino; Y. Koizumi; N. Tsuji; M. Morioka; K. Hirao; Y. Shirai

doi:10.1016/S1468-6996(01)00003-1

Pt diffusion in B2-type ordered NiAl intermetallic compound and its diffusion mechanisms

Y. Minamino, Y. Koizumi, N. Tsuji, M. Morioka, K. Hirao, Y. Shirai

Materials Processing and Characterization Division

Research output: Contribution to journal › Article › peer-review

21 Citations (Scopus)

Abstract

Diffusion of platinum element which increase protectivity of NiAl layer for hot corrosion and oxidation of Ni-base superalloys was investigated in NiAl compound with compositions of 43.7-51.9 at% Al at 1373-1673 K by the diffusion couple method. The diffusion coefficients, D_Pt, exhibit a large concentration dependence of valley type-shape; the D_Pt has the minimum value quite near the stoichiometric composition and it increases with deviation from the stoichiometry. On the other hand, the activation energy, Q, shows the maximum value near the stoichiometry. Q slightly decreases with Ni composition in Ni-rich side, while it decrease dramatically with Al composition in Al-rich side. Diffusion of platinum element in NiAl occurs mainly by the Triple defect mechanism at stoichiometry, by the anti-site atom bridge mechanism in considerably off-stoichiometry in Ni-rich side and by the next nearest neighbor-jump mechanism with constitutional Ni vacancies in quite off-stoichiometry in Al-rich side.

Original language	English
Pages (from-to)	237-249
Number of pages	13
Journal	Science and Technology of Advanced Materials
Volume	1
Issue number	4
DOIs	https://doi.org/10.1016/S1468-6996(01)00003-1
Publication status	Published - 2000 Dec

Keywords

Activation energy
Anti-site atoms
Diffusion
Divacancy
Frequency factor
Intermetallic compound
Nearest neighbor jumps
Next nearest neighbor jumps
NiAl
Ordering
Platinum
Triple defects
Vacancies

ASJC Scopus subject areas

Materials Science(all)

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10.1016/S1468-6996(01)00003-1

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@article{42b0946db54e41a3b4d669dd6b29d955,

title = "Pt diffusion in B2-type ordered NiAl intermetallic compound and its diffusion mechanisms",

abstract = "Diffusion of platinum element which increase protectivity of NiAl layer for hot corrosion and oxidation of Ni-base superalloys was investigated in NiAl compound with compositions of 43.7-51.9 at% Al at 1373-1673 K by the diffusion couple method. The diffusion coefficients, DPt, exhibit a large concentration dependence of valley type-shape; the DPt has the minimum value quite near the stoichiometric composition and it increases with deviation from the stoichiometry. On the other hand, the activation energy, Q, shows the maximum value near the stoichiometry. Q slightly decreases with Ni composition in Ni-rich side, while it decrease dramatically with Al composition in Al-rich side. Diffusion of platinum element in NiAl occurs mainly by the Triple defect mechanism at stoichiometry, by the anti-site atom bridge mechanism in considerably off-stoichiometry in Ni-rich side and by the next nearest neighbor-jump mechanism with constitutional Ni vacancies in quite off-stoichiometry in Al-rich side.",

keywords = "Activation energy, Anti-site atoms, Diffusion, Divacancy, Frequency factor, Intermetallic compound, Nearest neighbor jumps, Next nearest neighbor jumps, NiAl, Ordering, Platinum, Triple defects, Vacancies",

author = "Y. Minamino and Y. Koizumi and N. Tsuji and M. Morioka and K. Hirao and Y. Shirai",

note = "Funding Information: This work was supported by the Grant-in-Aid for Scientific Research of the Japanese Minister of Education, Science and Culture (C-2-09650717). The authors express their appreciation for the support.",

year = "2000",

month = dec,

doi = "10.1016/S1468-6996(01)00003-1",

language = "English",

volume = "1",

pages = "237--249",

journal = "Science and Technology of Advanced Materials",

issn = "1468-6996",

publisher = "IOP Publishing Ltd.",

number = "4",

}

TY - JOUR

T1 - Pt diffusion in B2-type ordered NiAl intermetallic compound and its diffusion mechanisms

AU - Minamino, Y.

AU - Koizumi, Y.

AU - Tsuji, N.

AU - Morioka, M.

AU - Hirao, K.

AU - Shirai, Y.

N1 - Funding Information: This work was supported by the Grant-in-Aid for Scientific Research of the Japanese Minister of Education, Science and Culture (C-2-09650717). The authors express their appreciation for the support.

PY - 2000/12

Y1 - 2000/12

N2 - Diffusion of platinum element which increase protectivity of NiAl layer for hot corrosion and oxidation of Ni-base superalloys was investigated in NiAl compound with compositions of 43.7-51.9 at% Al at 1373-1673 K by the diffusion couple method. The diffusion coefficients, DPt, exhibit a large concentration dependence of valley type-shape; the DPt has the minimum value quite near the stoichiometric composition and it increases with deviation from the stoichiometry. On the other hand, the activation energy, Q, shows the maximum value near the stoichiometry. Q slightly decreases with Ni composition in Ni-rich side, while it decrease dramatically with Al composition in Al-rich side. Diffusion of platinum element in NiAl occurs mainly by the Triple defect mechanism at stoichiometry, by the anti-site atom bridge mechanism in considerably off-stoichiometry in Ni-rich side and by the next nearest neighbor-jump mechanism with constitutional Ni vacancies in quite off-stoichiometry in Al-rich side.

AB - Diffusion of platinum element which increase protectivity of NiAl layer for hot corrosion and oxidation of Ni-base superalloys was investigated in NiAl compound with compositions of 43.7-51.9 at% Al at 1373-1673 K by the diffusion couple method. The diffusion coefficients, DPt, exhibit a large concentration dependence of valley type-shape; the DPt has the minimum value quite near the stoichiometric composition and it increases with deviation from the stoichiometry. On the other hand, the activation energy, Q, shows the maximum value near the stoichiometry. Q slightly decreases with Ni composition in Ni-rich side, while it decrease dramatically with Al composition in Al-rich side. Diffusion of platinum element in NiAl occurs mainly by the Triple defect mechanism at stoichiometry, by the anti-site atom bridge mechanism in considerably off-stoichiometry in Ni-rich side and by the next nearest neighbor-jump mechanism with constitutional Ni vacancies in quite off-stoichiometry in Al-rich side.

KW - Activation energy

KW - Anti-site atoms

KW - Diffusion

KW - Divacancy

KW - Frequency factor

KW - Intermetallic compound

KW - Nearest neighbor jumps

KW - Next nearest neighbor jumps

KW - NiAl

KW - Ordering

KW - Platinum

KW - Triple defects

KW - Vacancies

UR - http://www.scopus.com/inward/record.url?scp=0008847338&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0008847338&partnerID=8YFLogxK

U2 - 10.1016/S1468-6996(01)00003-1

DO - 10.1016/S1468-6996(01)00003-1

M3 - Article

AN - SCOPUS:0008847338

VL - 1

SP - 237

EP - 249

JO - Science and Technology of Advanced Materials

JF - Science and Technology of Advanced Materials

SN - 1468-6996

IS - 4

ER -

Pt diffusion in B2-type ordered NiAl intermetallic compound and its diffusion mechanisms

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Keywords

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