Pseudo-interface formation and diffusion behaviour in the B2 phase region of NiAl-base diffusion couples

R. Kainuma, H. Ikenoya, I. Ohnuma, K. Ishida

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

The microstructure and concentration profiles in the B2 phase region of the diffusion couples of Ni-Al-X (X: Ti, V, Cr, Mn, Fe, Co and Cu) ternary systems were examined by EPMA. A pseudo-interface between β1, (low Al) / β2 (high Al) characterized by a sharp change in the concentration profiles of both Al and the alloying element is observed in composition range near 50at%Al. The characteristic features of the concentration profiles in the Ni-Al base ternary diffusion couples are presented and the up-hill diffusion of alloying elements observed at the pseudo-interface of the Ni-Al-X (X: Ti, V, Cr, Mn, Fe, Co and Cu) ternary systems is discussed from a thermodynamic point of view.

Original languageEnglish
Pages (from-to)425-430
Number of pages6
JournalDefect and Diffusion Forum
Volume143-147
DOIs
Publication statusPublished - 1997

Keywords

  • Diffusion Couple
  • NiAl Base Systems
  • Pseudo-Interface
  • Thermodynamic Factor
  • Up-Hill Diffusion

ASJC Scopus subject areas

  • Radiation
  • Materials Science(all)
  • Condensed Matter Physics

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