Propagation of a dielectric barrier discharge in a multichannel mixing chip microreactor

Sven Stauss; Chikako Ishii; Koichi Kuribara; Keiichiro Urabe; Kazuo Terashima

doi:10.1109/TPS.2014.2334496

Propagation of a dielectric barrier discharge in a multichannel mixing chip microreactor

Sven Stauss, Chikako Ishii, Koichi Kuribara, Keiichiro Urabe, Kazuo Terashima

Research output: Contribution to journal › Article › peer-review

Abstract

An atmospheric-pressure dielectric barrier discharge was generated inside a T-type mixing multichannel chip microreactor in argon, at peak-to-peak voltages of 3.0 kV, and a frequency of 10 kHz. Time-resolved imaging and current-voltage measurements revealed temporal and spatial variation of the discharge, and the appearance of discharge nonuniformities that are considered to arise due to small pressure differences caused by the microchannel geometry, and the mixing of gas flows in regions where the channels connect.

Original language	English
Article number	6856210
Pages (from-to)	2358-2359
Number of pages	2
Journal	IEEE Transactions on Plasma Science
Volume	42
Issue number	10
DOIs	https://doi.org/10.1109/TPS.2014.2334496
Publication status	Published - 2014 Oct 1
Externally published	Yes

Keywords

Atmospheric-pressure plasmas
current-voltage characteristics
dielectric barrier discharge
plasma microreactor
plasma sources
time-resolved imaging.

ASJC Scopus subject areas

Nuclear and High Energy Physics
Condensed Matter Physics

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10.1109/TPS.2014.2334496

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title = "Propagation of a dielectric barrier discharge in a multichannel mixing chip microreactor",

abstract = "An atmospheric-pressure dielectric barrier discharge was generated inside a T-type mixing multichannel chip microreactor in argon, at peak-to-peak voltages of 3.0 kV, and a frequency of 10 kHz. Time-resolved imaging and current-voltage measurements revealed temporal and spatial variation of the discharge, and the appearance of discharge nonuniformities that are considered to arise due to small pressure differences caused by the microchannel geometry, and the mixing of gas flows in regions where the channels connect.",

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author = "Sven Stauss and Chikako Ishii and Koichi Kuribara and Keiichiro Urabe and Kazuo Terashima",

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doi = "10.1109/TPS.2014.2334496",

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AU - Stauss, Sven

AU - Ishii, Chikako

AU - Kuribara, Koichi

AU - Urabe, Keiichiro

AU - Terashima, Kazuo

PY - 2014/10/1

Y1 - 2014/10/1

N2 - An atmospheric-pressure dielectric barrier discharge was generated inside a T-type mixing multichannel chip microreactor in argon, at peak-to-peak voltages of 3.0 kV, and a frequency of 10 kHz. Time-resolved imaging and current-voltage measurements revealed temporal and spatial variation of the discharge, and the appearance of discharge nonuniformities that are considered to arise due to small pressure differences caused by the microchannel geometry, and the mixing of gas flows in regions where the channels connect.

AB - An atmospheric-pressure dielectric barrier discharge was generated inside a T-type mixing multichannel chip microreactor in argon, at peak-to-peak voltages of 3.0 kV, and a frequency of 10 kHz. Time-resolved imaging and current-voltage measurements revealed temporal and spatial variation of the discharge, and the appearance of discharge nonuniformities that are considered to arise due to small pressure differences caused by the microchannel geometry, and the mixing of gas flows in regions where the channels connect.

KW - Atmospheric-pressure plasmas

KW - current-voltage characteristics

KW - dielectric barrier discharge

KW - plasma microreactor

KW - plasma sources

KW - time-resolved imaging.

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Propagation of a dielectric barrier discharge in a multichannel mixing chip microreactor

Abstract

Keywords

ASJC Scopus subject areas

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