Profile control of large-area rectangular plasma in a modified-magnetron-type RF discharge

Takashi Koshimizu, Masanobu Sato, Unryu Ogawa, Satoru Iizuka, Noriyoshi Sato

Research output: Contribution to journalConference articlepeer-review

1 Citation (Scopus)

Abstract

A large-area rectangular modified-magnetron-type (MMT) radio frequency (RF) plasma source is newly developed and the properties are investigated in detail for producing a large-area uniform plasma. A quite uniform plasma with density variation less than several percent is produced in front of the rectangular substrate of 830×650 mm2. The spatial plasma uniformity is controlled not only by employing an upper auxiliary electrode but also by putting permanent magnets on the auxiliary electrode in several patterns. We now produce more uniform plasma by using auxiliary permanent magnets put on the upper auxiliary lid electrode.

Original languageEnglish
Pages (from-to)192-197
Number of pages6
JournalThin Solid Films
Volume407
Issue number1-2
DOIs
Publication statusPublished - 2002 Mar 22
EventProceedinggs of the 14th Symposium on Plasma Science for Marteri (SPSM-14) - Tokyo, Japan
Duration: 2001 Jun 132001 Jun 14

Keywords

  • Chemical vapor deposition
  • Magnetron discharge
  • Plasma processing
  • RF discharge
  • Rectangular plasma

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

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