Abstract
High-resolution synchrotron radiation photoemission results for O 2 physisorbed on GaAs (110) show Ga-O and As-O formation that is a direct result of photon-induced reaction at 20 K. Spatially resolved studies show that the thickness and chemical composition of the semiconductor oxides vary in proporition to total beam irradiation. The extent of reaction can be controlled by varying the amount of oxygen present on the surface, and As 5+-like bonding configurations can be formed. These results can only be understood when competition between thermodynamic, kinetic, photon- and electron-mediated processes are considered.
Original language | English |
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Pages (from-to) | 2510-2512 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 56 |
Issue number | 25 |
DOIs | |
Publication status | Published - 1990 |
Externally published | Yes |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)