Production of a large-diameter uniform plasma by modified magnetron-typed radio frequency discharge

Yunlong Li, Satoru Iizuka, Noriyoshi Sato

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

The properties of a new plasma source, i.e. a large-scale modified-magnetron typed (MMT) radio frequency (RF) plasma source, are investigated for producing a uniform high-density plasma with a large diameter of the order of 1 m. A plasma with uniformity within a few percent is produced over 120 cm in diameter in front of the substrate under an argon pressure of 1 mTorr. The plasma density is 6 × 1010 cm-3 at the axial center of the RF electrode when the incident RF power is 2.8kW. The plasma density is almost proportional to the RF power. Since the structure of MMT plasma source is quite simple, it is useful for large area plasma processing.

Original languageEnglish
Pages (from-to)4554-4557
Number of pages4
JournalJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume36
Issue number7 SUPPL. B
DOIs
Publication statusPublished - 1997 Jul

Keywords

  • Large-area plasma processing
  • Large-diameter plasma
  • Modified-magnetron typed RF plasma
  • Uniform plasma

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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