Production and application of reactive plasmas using helicon-wave discharge in very low magnetic fields

G. Sato, T. Kato, W. Oohara, R. Hatakeyama

Research output: Contribution to journalArticle

8 Citations (Scopus)

Abstract

In order to explore new application fields of a helicon-wave discharge, we have investigated the production of helicon-wave plasmas in very low magnetic fields (0-10 mT) and the resultant nanocarbon creation using methane and/or hydrogen. The reactive plasmas are effectively produced by the helicon wave around 3 mT independently of gas species in the wide range of pressures (0.1-10 Pa), where hydrocarbons and atomic hydrogens are generated. Using the helicon-wave reactive plasma as a precursor source for plasma-enhanced chemical vapor deposition, well-aligned carbon nanotubes and nanowalls are found to be formed even in a very low gas pressure of 0.7 Pa.

Original languageEnglish
Pages (from-to)550-554
Number of pages5
JournalThin Solid Films
Volume506-507
DOIs
Publication statusPublished - 2006 May 26

Keywords

  • Carbon
  • Helicon-wave discharge
  • Nanostructures
  • Plasma enhanced chemical vapor deposition

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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