Process performance of hydrogen-terminated silicon surface

Jun Takano, Masakazu Nakamura, Akinobu Teramoto, Takashi Imaoka, Masahiko Kogure, Tadahiro Ohmi

Research output: Contribution to conferencePaper

Abstract

The authors show that the smoothness of the Si surface is significantly affected by electric characteristics of a device. A technology is introduced to cover the Si(111) surface with mono hydride.

Original languageEnglish
Pages199-223
Number of pages25
Publication statusPublished - 1992 Dec 1
EventConference on Semiconductor Pure Water and Chemicals - Santa Clara, CA, USA
Duration: 1992 Feb 111992 Feb 13

Other

OtherConference on Semiconductor Pure Water and Chemicals
CitySanta Clara, CA, USA
Period92/2/1192/2/13

ASJC Scopus subject areas

  • Water Science and Technology
  • Electronic, Optical and Magnetic Materials

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