Process parameter calibration for millimeter-wave CMOS back-end device design with electromagnetic field analysis

S. Amakawa, A. Orii, K. Katayama, K. Takano, Mizuki Motoyoshi, T. Yoshida, M. Fujishima

Research output: Chapter in Book/Report/Conference proceedingConference contribution

5 Citations (Scopus)

Abstract

This paper presents a systematic procedure for calibrating process parameters for electromagnetic field analysis. A few CMOS back-end material parameters are first chosen as fitting parameters by sensitivity analysis, and then their values are unambiguously determined from contour maps showing electrical characteristics versus effective material parameters. Calibration with measured data for 1-170 GHz is shown to give reasonably predictive simulation even at higher frequencies. Extraction of effective complex permittivities are also attempted up to 325 GHz in the presence of dummy metal fills for two filling patterns. The results indicate that the effective-parameter approach to dummy metal fills can reproduce measured propagation constants of transmission lines. The predictive power of such a simple approach is yet to be assessed.

Original languageEnglish
Title of host publication2014 IEEE International Conference on Microelectronic Test Structures, ICMTS 2014 - Conference Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages182-187
Number of pages6
ISBN (Print)9781479921928
DOIs
Publication statusPublished - 2014 Jan 1
Externally publishedYes
Event27th International Conference on Microelectronic Test Structures, ICMTS 2014 - Udine, Italy
Duration: 2014 Mar 242014 Mar 27

Publication series

NameIEEE International Conference on Microelectronic Test Structures

Conference

Conference27th International Conference on Microelectronic Test Structures, ICMTS 2014
CountryItaly
CityUdine
Period14/3/2414/3/27

ASJC Scopus subject areas

  • Electrical and Electronic Engineering

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  • Cite this

    Amakawa, S., Orii, A., Katayama, K., Takano, K., Motoyoshi, M., Yoshida, T., & Fujishima, M. (2014). Process parameter calibration for millimeter-wave CMOS back-end device design with electromagnetic field analysis. In 2014 IEEE International Conference on Microelectronic Test Structures, ICMTS 2014 - Conference Proceedings (pp. 182-187). [6841490] (IEEE International Conference on Microelectronic Test Structures). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ICMTS.2014.6841490