Process of crystallization in thin amorphous tin oxide film

T. Kobayashi, Y. Kimura, H. Suzuki, T. Sato, T. Tanigaki, Y. Saito, C. Kaito

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)

Abstract

Amorphous tin oxide films deposited on carbon substrates have been studied by high-resolution transmission electron microscopy. As-deposited film was composed of a mixture of microcrystallites of SnO, SnO2 and SnO3 with size of 2 nm. Crystallization took place above 450°C. SnO crystals appeared between 450°C and 500°C, whereas SnO2 crystals appeared above 550°C. The appearance of β-tin crystals with the reduction of tin oxide has been verified using the heating stage of the electron microscope. A drop of liquid tin was recognized upon heating above 500°C. The difference in crystallization upon applying an electron beam, synchrotron radiation and heating in vacuum has been summarized and discussed with respect to the problem of the excitation of crystallites.

Original languageEnglish
Pages (from-to)143-150
Number of pages8
JournalJournal of Crystal Growth
Volume243
Issue number1
DOIs
Publication statusPublished - 2002 Aug 3

Keywords

  • A1. Crystal morphology
  • A1. Crystal structure
  • A1. Crystallites
  • B1. Oxides

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Inorganic Chemistry
  • Materials Chemistry

Fingerprint

Dive into the research topics of 'Process of crystallization in thin amorphous tin oxide film'. Together they form a unique fingerprint.

Cite this