Printing sub-100 nanometer features near-field photolithography

Shuji Tanaka; Masayuki Nakao; Yotaro Hatamura; Masanori Komuro; Hiroshi Hiroshima; Masahiro Hatakeyama

doi:10.1143/jjap.37.6739

Printing sub-100 nanometer features near-field photolithography

Shuji Tanaka, Masayuki Nakao, Yotaro Hatamura, Masanori Komuro, Hiroshi Hiroshima, Masahiro Hatakeyama

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

In this paper, a near-field photolithographic method which can realize ultra high resolution beyond the diffraction limit of light is described. Evanescent light generated on a transparent mold with a micro-relief illuminated on the condition of total internal reflection is used to expose a photoresist in contact with the mold. The plastic replica mold is flexible to eliminate the difficulty of close contact with the photoresist, and the replica mold damaged by the contact with the photoresist is disposable to maintain a high yield rate. We printed sub-100nm features on a commercially available photoresist using 442-nm-wavelength light.

Original language	English
Pages (from-to)	6739-6744
Number of pages	6
Journal	Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
Volume	37
Issue number	12 B
DOIs	https://doi.org/10.1143/jjap.37.6739
Publication status	Published - 1998
Externally published	Yes

Keywords

Evanescent light
High resolution
Optical near-field
Photolithography
Replication

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

Access to Document

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Printing sub-100 nanometer features near-field photolithography. / Tanaka, Shuji; Nakao, Masayuki; Hatamura, Yotaro; Komuro, Masanori; Hiroshima, Hiroshi; Hatakeyama, Masahiro.

In: Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, Vol. 37, No. 12 B, 1998, p. 6739-6744.

Research output: Contribution to journal › Article › peer-review

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