Print and imprint method for nanoimprint lithography with high-viscosity photo-curable resins

Takahiro Nakamura, Masaru Nakagawa

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Citation (Scopus)

    Abstract

    Ultraviolet nanoimprint lithography (UV-NIL) has become one of advanced pattering methods for fabrication of micro-and nano-structures over several inches by replication with designed mold patterns at high throughput and low cost. For practical application of UV-NIL, it is essential to eliminate bubble defects and to make residual layer thicknesses (RLTs) of a fabricated resist pattern uniform after the imprint process for subsequent dry-etching processes. We demonstrated the high-viscosity UV-curable resin (viscosity=12,800 mPas) suitable for bubble-defect-free UV nanoimprinting in a condensable gas atmosphere. We enabled to deposit droplets of the high-viscosity resin on a substrate by screen printing with a through-hole membrane with the volume of sub-pico liter. The method was effective for leveling RLTs in bubble-defect-free UV-NIL. In the present study, we give an overview of 'Print and Imprint' method comprising screen printing and UV-NIL, and demonstrate the position-selective placement of high-viscosity resin droplets by screen printing.

    Original languageEnglish
    Title of host publication2017 International Conference on Electronics Packaging, ICEP 2017
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    Pages443-446
    Number of pages4
    ISBN (Electronic)9784990218836
    DOIs
    Publication statusPublished - 2017 Jun 5
    Event2017 International Conference on Electronics Packaging, ICEP 2017 - Tendo, Yamagata, Japan
    Duration: 2017 Apr 192017 Apr 22

    Publication series

    Name2017 International Conference on Electronics Packaging, ICEP 2017

    Other

    Other2017 International Conference on Electronics Packaging, ICEP 2017
    Country/TerritoryJapan
    CityTendo, Yamagata
    Period17/4/1917/4/22

    Keywords

    • UV nanoimprint lithography (UV-NIL)
    • UV-curable resin
    • laser drilling
    • screen printing

    ASJC Scopus subject areas

    • Electrical and Electronic Engineering
    • Industrial and Manufacturing Engineering
    • Electronic, Optical and Magnetic Materials

    Fingerprint

    Dive into the research topics of 'Print and imprint method for nanoimprint lithography with high-viscosity photo-curable resins'. Together they form a unique fingerprint.

    Cite this