Print and imprint method for nanoimprint lithography with high-viscosity photo-curable resins

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Ultraviolet nanoimprint lithography (UV-NIL) has become one of advanced pattering methods for fabrication of micro-and nano-structures over several inches by replication with designed mold patterns at high throughput and low cost. For practical application of UV-NIL, it is essential to eliminate bubble defects and to make residual layer thicknesses (RLTs) of a fabricated resist pattern uniform after the imprint process for subsequent dry-etching processes. We demonstrated the high-viscosity UV-curable resin (viscosity=12,800 mPas) suitable for bubble-defect-free UV nanoimprinting in a condensable gas atmosphere. We enabled to deposit droplets of the high-viscosity resin on a substrate by screen printing with a through-hole membrane with the volume of sub-pico liter. The method was effective for leveling RLTs in bubble-defect-free UV-NIL. In the present study, we give an overview of 'Print and Imprint' method comprising screen printing and UV-NIL, and demonstrate the position-selective placement of high-viscosity resin droplets by screen printing.

Original languageEnglish
Title of host publication2017 International Conference on Electronics Packaging, ICEP 2017
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages443-446
Number of pages4
ISBN (Electronic)9784990218836
DOIs
Publication statusPublished - 2017 Jun 5
Event2017 International Conference on Electronics Packaging, ICEP 2017 - Tendo, Yamagata, Japan
Duration: 2017 Apr 192017 Apr 22

Publication series

Name2017 International Conference on Electronics Packaging, ICEP 2017

Other

Other2017 International Conference on Electronics Packaging, ICEP 2017
CountryJapan
CityTendo, Yamagata
Period17/4/1917/4/22

Keywords

  • UV nanoimprint lithography (UV-NIL)
  • UV-curable resin
  • laser drilling
  • screen printing

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Industrial and Manufacturing Engineering
  • Electronic, Optical and Magnetic Materials

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