Preparation of titania solid films by laser CVD using CO2 laser

Ming Gao; Akihiko Ito; Rong Tu; Takashi Goto

doi:10.4028/www.scientific.net/KEM.508.279

Preparation of titania solid films by laser CVD using CO₂ laser

Ming Gao, Akihiko Ito, Rong Tu, Takashi Goto

Materials Processing and Characterization Division

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

2 Citations (Scopus)

Abstract

Titania (TiO₂) films having dense and solid microstructure were prepared by laser chemical vapor deposition using CO₂ laser. The effects of deposition temperature (T_dep) and total chamber pressure (P_tot) on phase and microstructure of TiO₂ films were investigated. At P_tot = 600 Pa and T_dep = 790 K, rutile TiO₂ film had a polygonal platelet grains 2 μm in size. At P _tot = 600 Pa and T_dep = 1010 K, rutile TiO₂ film had (110) orientation and consisted of a truncated polyhedron 5-6 μm in size. At P_tot = 200 Pa and T_dep = 955 K, rutile TiO ₂ film has a solid columnar having faceted surface. A dense and solid TiO₂ film was obtained at P_tot = 200 Pa and T _dep = 1120 K. The deposition rate of TiO₂ solid film was reached 240 μm h^-1.

Original language	English
Title of host publication	Materials Integration
Publisher	Trans Tech Publications Ltd
Pages	279-282
Number of pages	4
ISBN (Print)	9783037853764
DOIs	https://doi.org/10.4028/www.scientific.net/KEM.508.279
Publication status	Published - 2012
Event	Int. Symposium of GCOE: Materials Integration, in Conjunction with the 2nd Int. Symposium on Advanced Synthesis and Processing Technology for Materials, ASPT 2011 and the 8th Materials Science School for Young Scientists, KINKEN-WAKATE 2011 - Sendai, Japan Duration: 2011 Dec 1 → 2011 Dec 2

Publication series

Name	Key Engineering Materials
Volume	508
ISSN (Print)	1013-9826
ISSN (Electronic)	1662-9795

Other

Other	Int. Symposium of GCOE: Materials Integration, in Conjunction with the 2nd Int. Symposium on Advanced Synthesis and Processing Technology for Materials, ASPT 2011 and the 8th Materials Science School for Young Scientists, KINKEN-WAKATE 2011
Country	Japan
City	Sendai
Period	11/12/1 → 11/12/2

Keywords

Laser CVD
Microstructure
Solid film

ASJC Scopus subject areas

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

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Gao, M, Ito, A, Tu, R & Goto, T 2012, Preparation of titania solid films by laser CVD using CO₂ laser. in Materials Integration. Key Engineering Materials, vol. 508, Trans Tech Publications Ltd, pp. 279-282, Int. Symposium of GCOE: Materials Integration, in Conjunction with the 2nd Int. Symposium on Advanced Synthesis and Processing Technology for Materials, ASPT 2011 and the 8th Materials Science School for Young Scientists, KINKEN-WAKATE 2011, Sendai, Japan, 11/12/1. https://doi.org/10.4028/www.scientific.net/KEM.508.279

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title = "Preparation of titania solid films by laser CVD using CO2 laser",

abstract = "Titania (TiO2) films having dense and solid microstructure were prepared by laser chemical vapor deposition using CO2 laser. The effects of deposition temperature (Tdep) and total chamber pressure (Ptot) on phase and microstructure of TiO2 films were investigated. At Ptot = 600 Pa and Tdep = 790 K, rutile TiO2 film had a polygonal platelet grains 2 μm in size. At P tot = 600 Pa and Tdep = 1010 K, rutile TiO2 film had (110) orientation and consisted of a truncated polyhedron 5-6 μm in size. At Ptot = 200 Pa and Tdep = 955 K, rutile TiO 2 film has a solid columnar having faceted surface. A dense and solid TiO2 film was obtained at Ptot = 200 Pa and T dep = 1120 K. The deposition rate of TiO2 solid film was reached 240 μm h-1.",

keywords = "Laser CVD, Microstructure, Solid film",

author = "Ming Gao and Akihiko Ito and Rong Tu and Takashi Goto",

note = "Copyright: Copyright 2020 Elsevier B.V., All rights reserved.; Int. Symposium of GCOE: Materials Integration, in Conjunction with the 2nd Int. Symposium on Advanced Synthesis and Processing Technology for Materials, ASPT 2011 and the 8th Materials Science School for Young Scientists, KINKEN-WAKATE 2011 ; Conference date: 01-12-2011 Through 02-12-2011",

year = "2012",

doi = "10.4028/www.scientific.net/KEM.508.279",

language = "English",

isbn = "9783037853764",

series = "Key Engineering Materials",

publisher = "Trans Tech Publications Ltd",

pages = "279--282",

booktitle = "Materials Integration",

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T1 - Preparation of titania solid films by laser CVD using CO2 laser

AU - Gao, Ming

AU - Ito, Akihiko

AU - Tu, Rong

AU - Goto, Takashi

PY - 2012

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N2 - Titania (TiO2) films having dense and solid microstructure were prepared by laser chemical vapor deposition using CO2 laser. The effects of deposition temperature (Tdep) and total chamber pressure (Ptot) on phase and microstructure of TiO2 films were investigated. At Ptot = 600 Pa and Tdep = 790 K, rutile TiO2 film had a polygonal platelet grains 2 μm in size. At P tot = 600 Pa and Tdep = 1010 K, rutile TiO2 film had (110) orientation and consisted of a truncated polyhedron 5-6 μm in size. At Ptot = 200 Pa and Tdep = 955 K, rutile TiO 2 film has a solid columnar having faceted surface. A dense and solid TiO2 film was obtained at Ptot = 200 Pa and T dep = 1120 K. The deposition rate of TiO2 solid film was reached 240 μm h-1.

AB - Titania (TiO2) films having dense and solid microstructure were prepared by laser chemical vapor deposition using CO2 laser. The effects of deposition temperature (Tdep) and total chamber pressure (Ptot) on phase and microstructure of TiO2 films were investigated. At Ptot = 600 Pa and Tdep = 790 K, rutile TiO2 film had a polygonal platelet grains 2 μm in size. At P tot = 600 Pa and Tdep = 1010 K, rutile TiO2 film had (110) orientation and consisted of a truncated polyhedron 5-6 μm in size. At Ptot = 200 Pa and Tdep = 955 K, rutile TiO 2 film has a solid columnar having faceted surface. A dense and solid TiO2 film was obtained at Ptot = 200 Pa and T dep = 1120 K. The deposition rate of TiO2 solid film was reached 240 μm h-1.

KW - Laser CVD

KW - Microstructure

KW - Solid film

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