Preparation of titania films on implant titanium by electron cyclotron resonance plasma oxidation

Hiroshi Masumoto, Takashi Goto, Yoshitomo Honda, Osamu Suzuki, Keiichi Sasaki

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Titania (TiO2) thin films were fabricated on titanium (Ti) substrates at low temperatures by electron cyclotron resonance (ECR) plasma oxidation, and the relationship among the oxidization conditions, crystal structure and osteoconductive property was investigated. Amorphous TiO2 films were obtained below 300°C and crystallized rutile-type TiO2 films were obtained above 400°C. The XRD peak intensity of rutile TiO2 increased with increasing oxidation temperature. Mixtures of octacalcium phosphate (OCP) and Dicalcium phosphate dihydrate (DCPD) peaks were observed after calcification. The intensity of the OCP and DCPD peaks after calcification increased with increasing oxidation temperature. The ECR plasma was significantly effective to prepare crystallized TiO2 films at low temperatures.

Original languageEnglish
Pages (from-to)565-568
Number of pages4
JournalKey Engineering Materials
Volume330-332 I
DOIs
Publication statusPublished - 2007 Jan 1

Keywords

  • Electron cyclotron resonance plasma oxidation
  • Octacalcium phosphate
  • Titania films

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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