Preparation of titania films on implant titanium by electron cyclotron resonance plasma oxidation

Hiroshi Masumoto; Takashi Goto; Yoshitomo Honda; Osamu Suzuki; Keiichi Sasaki

doi:10.4028/0-87849-422-7.565

Preparation of titania films on implant titanium by electron cyclotron resonance plasma oxidation

Hiroshi Masumoto, Takashi Goto, Yoshitomo Honda, Osamu Suzuki, Keiichi Sasaki

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

Titania (TiO2) thin films were fabricated on titanium (Ti) substrates at low temperatures by electron cyclotron resonance (ECR) plasma oxidation, and the relationship among the oxidization conditions, crystal structure and osteoconductive property was investigated. Amorphous TiO2 films were obtained below 300°C and crystallized rutile-type TiO2 films were obtained above 400°C. The XRD peak intensity of rutile TiO2 increased with increasing oxidation temperature. Mixtures of octacalcium phosphate (OCP) and Dicalcium phosphate dihydrate (DCPD) peaks were observed after calcification. The intensity of the OCP and DCPD peaks after calcification increased with increasing oxidation temperature. The ECR plasma was significantly effective to prepare crystallized TiO2 films at low temperatures.

Original language	English
Pages (from-to)	565-568
Number of pages	4
Journal	Key Engineering Materials
Volume	330-332 I
DOIs	https://doi.org/10.4028/0-87849-422-7.565
Publication status	Published - 2007 Jan 1

Keywords

Electron cyclotron resonance plasma oxidation
Octacalcium phosphate
Titania films

ASJC Scopus subject areas

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

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10.4028/0-87849-422-7.565

Cite this

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title = "Preparation of titania films on implant titanium by electron cyclotron resonance plasma oxidation",

abstract = "Titania (TiO2) thin films were fabricated on titanium (Ti) substrates at low temperatures by electron cyclotron resonance (ECR) plasma oxidation, and the relationship among the oxidization conditions, crystal structure and osteoconductive property was investigated. Amorphous TiO2 films were obtained below 300°C and crystallized rutile-type TiO2 films were obtained above 400°C. The XRD peak intensity of rutile TiO2 increased with increasing oxidation temperature. Mixtures of octacalcium phosphate (OCP) and Dicalcium phosphate dihydrate (DCPD) peaks were observed after calcification. The intensity of the OCP and DCPD peaks after calcification increased with increasing oxidation temperature. The ECR plasma was significantly effective to prepare crystallized TiO2 films at low temperatures.",

keywords = "Electron cyclotron resonance plasma oxidation, Octacalcium phosphate, Titania films",

author = "Hiroshi Masumoto and Takashi Goto and Yoshitomo Honda and Osamu Suzuki and Keiichi Sasaki",

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TY - JOUR

T1 - Preparation of titania films on implant titanium by electron cyclotron resonance plasma oxidation

AU - Masumoto, Hiroshi

AU - Goto, Takashi

AU - Honda, Yoshitomo

AU - Suzuki, Osamu

AU - Sasaki, Keiichi

PY - 2007/1/1

Y1 - 2007/1/1

N2 - Titania (TiO2) thin films were fabricated on titanium (Ti) substrates at low temperatures by electron cyclotron resonance (ECR) plasma oxidation, and the relationship among the oxidization conditions, crystal structure and osteoconductive property was investigated. Amorphous TiO2 films were obtained below 300°C and crystallized rutile-type TiO2 films were obtained above 400°C. The XRD peak intensity of rutile TiO2 increased with increasing oxidation temperature. Mixtures of octacalcium phosphate (OCP) and Dicalcium phosphate dihydrate (DCPD) peaks were observed after calcification. The intensity of the OCP and DCPD peaks after calcification increased with increasing oxidation temperature. The ECR plasma was significantly effective to prepare crystallized TiO2 films at low temperatures.

AB - Titania (TiO2) thin films were fabricated on titanium (Ti) substrates at low temperatures by electron cyclotron resonance (ECR) plasma oxidation, and the relationship among the oxidization conditions, crystal structure and osteoconductive property was investigated. Amorphous TiO2 films were obtained below 300°C and crystallized rutile-type TiO2 films were obtained above 400°C. The XRD peak intensity of rutile TiO2 increased with increasing oxidation temperature. Mixtures of octacalcium phosphate (OCP) and Dicalcium phosphate dihydrate (DCPD) peaks were observed after calcification. The intensity of the OCP and DCPD peaks after calcification increased with increasing oxidation temperature. The ECR plasma was significantly effective to prepare crystallized TiO2 films at low temperatures.

KW - Electron cyclotron resonance plasma oxidation

KW - Octacalcium phosphate

KW - Titania films

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JO - Key Engineering Materials

JF - Key Engineering Materials

SN - 1013-9826

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Preparation of titania films on implant titanium by electron cyclotron resonance plasma oxidation

Abstract

Keywords

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