TY - JOUR
T1 - Preparation of TiO2-rich Ba-Ti-O thick films by laser chemical vapor deposition method
AU - Guo, Dongyun
AU - Ito, Akihiko
AU - Goto, Takashi
AU - Tu, Rong
AU - Wang, Chuanbin
AU - Shen, Qiang
AU - Zhang, Lianmeng
N1 - Funding Information:
This work was supported in part by the Global COE Program of the Materials Integration, Tohoku University, and by the International Science and Technology Cooperation Program of China (Grant No. 2009DFB50470).
Publisher Copyright:
© 2013, The Author(s).
PY - 2013/6/1
Y1 - 2013/6/1
N2 - TiO2-rich Ba-Ti-O films were prepared on Pt/Ti/SiO2/Si substrate by laser chemical vapor deposition (LCVD). Their phase relationship and microstructure were investigated. The single-phase BaTi2O5, Ba4Ti13O30 and BaTi5O11 films were prepared at Ti/Ba molar ratios mTi/Ba = 1.84–1.90, 2.83 and 4.49–4.55, respectively. The high deposition rate of TiO2-rich Ba-Ti-O films ranged from 54.0 μm/h to 177.6 μm/h. The permittivity of BaTi2O5 film (prepared at mTi/Ba = 1.84 and deposition temperature Tdep = 877 K), Ba4Ti13O30 film (prepared at mTi/Ba = 2.83 and Tdep = 914 K) and BaTi5O11 film (prepared at mTi/Ba = 4.49 and Tdep = 955 K) were 50, 40 and 21, respectively.
AB - TiO2-rich Ba-Ti-O films were prepared on Pt/Ti/SiO2/Si substrate by laser chemical vapor deposition (LCVD). Their phase relationship and microstructure were investigated. The single-phase BaTi2O5, Ba4Ti13O30 and BaTi5O11 films were prepared at Ti/Ba molar ratios mTi/Ba = 1.84–1.90, 2.83 and 4.49–4.55, respectively. The high deposition rate of TiO2-rich Ba-Ti-O films ranged from 54.0 μm/h to 177.6 μm/h. The permittivity of BaTi2O5 film (prepared at mTi/Ba = 1.84 and deposition temperature Tdep = 877 K), Ba4Ti13O30 film (prepared at mTi/Ba = 2.83 and Tdep = 914 K) and BaTi5O11 film (prepared at mTi/Ba = 4.49 and Tdep = 955 K) were 50, 40 and 21, respectively.
KW - TiO-rich Ba-Ti-O film
KW - deposition temperature
KW - dielectric properties
KW - laser chemical vapor deposition (LCVD)
KW - microstructure
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U2 - 10.1007/s40145-013-0057-x
DO - 10.1007/s40145-013-0057-x
M3 - Article
AN - SCOPUS:84974531638
VL - 2
SP - 167
EP - 172
JO - Journal of Advanced Ceramics
JF - Journal of Advanced Ceramics
SN - 2226-4108
IS - 2
ER -