Preparation of TiO2 coating on dental metal materials by plasma CVD

Ryotaro Marumori, Teiichi Kimura, Takashi Goto, Masanobu Yoda, Kohei Kimura

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

In this study, TiO2 films were prepared on Ag-Pd alloys by Plasma-enhanced Chemical Vapor Deposition (PECVD) using Ti(O-i-Pr) 2(dpm)2 precursor. Ag-Pd alloys are widely used as a substrate material of a resin-veneered dental crown. Since an adhesion of a dental resin to the Ag-Pd alloy substrate is poor, protuberances are usually formed on the substrate surface to sustain the mechanical retention. One of the weak points in the resin-veneered dental crown is that a mechanical retention should be indispensable to fix the resin onto the metal frame. Instead of mechanical retention, TiO2 films were prepared on the substrates. The effects of the deposition conditions on the crystalline phases, microstructures, and color of the deposited films were investigated. As a result, at a substrate pre-heating temperature Tdep=500 °C, microwave power PM = 2 kW, deposition pressure Ptot,=0.4 or 0.7 kPa, the film color changed from black to white, and crystalline phase was anatase. And the microstructure of the film was granular. The grain size was a diameter of about 100nm. These are optimum deposition conditions.

Original languageEnglish
Pages (from-to)331-335
Number of pages5
JournalFuntai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy
Volume55
Issue number5
DOIs
Publication statusPublished - 2008 May 1

Keywords

  • Dental crown
  • Deposition condition
  • PECVD
  • Resin
  • TiO

ASJC Scopus subject areas

  • Mechanical Engineering
  • Industrial and Manufacturing Engineering
  • Metals and Alloys
  • Materials Chemistry

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