Preparation of Ti(O,N) films by laser chemical vapor deposition for functionally gradient coating on Ti(C,N)-based cermet

Tatsuya Yonesaki, Akihiko Ito, Takashi Goto

Research output: Contribution to journalArticle

3 Citations (Scopus)

Abstract

Tianium oxynitride (Ti (O,N)) films were prepared on a Ti (C,N)-based cermet substrate by laser chemical vapor deposition using titanium tetraisopropoxide and NH3 as precursors. A mixture of TiO2 and cubic TiO films was obtained at a deposition temperature of 820K. Single-phase cubic Ti(O,N) films were prepared at 850-HOOK. With increasing deposition temperature from 850 to 1100 K, the lattice parameter of the Ti (O,N) film increased from 0.4194 to 0.4244 nm, as the N to O ratio in the Ti(O,N) film changed from TiO to TiN. Ti(O,N) films consisted of pyramidal grains with a columnar structure. Ti (O,N) films exhibited higher adhesion at higher deposition temperatures and lower total pressures.

Original languageEnglish
Pages (from-to)405-409
Number of pages5
JournalFuntai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy
Volume59
Issue number7
DOIs
Publication statusPublished - 2012 Jul 1

Keywords

  • Film
  • Functionally gradient material
  • Laser chemical vapor deposition
  • Titanium oxynitride

ASJC Scopus subject areas

  • Mechanical Engineering
  • Industrial and Manufacturing Engineering
  • Metals and Alloys
  • Materials Chemistry

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