Preparation of superconducting YBa2Cu3O7-x films by ecr plasma sputtering

Takashi Goto, Hiroshi Masumoto, Toshio Hirai

Research output: Contribution to journalArticlepeer-review

12 Citations (Scopus)

Abstract

Y-Ba-Cu-O films were prepared on (100)MgO single crystal substrates by ECR plasma sputtering. As-deposited films without substrate heating were amorphous and electrically insulating. The amorphous film was crystallized to YBa2Cu3O7-x by postannealing at 930°C for 1 min in O2 gas, and the Tc of the postannealed film was 70.5 K. The film prepared at the substrate temperature of 650°C was crystalline YBa2Cu3O7-x and the Tc of the film without any postannealing was 73 K.

Original languageEnglish
Pages (from-to)L88-L90
JournalJapanese journal of applied physics
Volume28
Issue number1 A
DOIs
Publication statusPublished - 1989 Jan

Keywords

  • ECR
  • Electron cyclotron resonance
  • Plasma
  • Sputtering
  • Superconducting
  • Y-Ba-Cu-O system

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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