Preparation of structure-graded yttria film by laser CVD

Translated title of the contribution: Preparation of structure-graded yttria film by laser CVD

Teiichi Kimura, Ryan Banal, Takashi Goto

Research output: Contribution to journalArticle

Abstract

Yttria films were prepared by laser CVD using an Y(dpm) 3 precursor. When the laser power (P L) was less than 100 W, deposition rates were small around 10 μm/h comparable to those by conventional thermal CVD. At P L> 160 W, deposition rates increased drastically to more than 200 μm/h. The highest deposition rate in this study was 270 μm/h, which is 100 times higher than that reported in literatures. Film morphologies changed from a dense isotropic structure to a (440) oriented columnar structure with increasing substrate pre-heating temperature. By changing PL during deposition, a structure-graded yttria film was obtained. Moreover, Periodically structure-graded yttria films were also prepared by periodical changing of P L.

Translated title of the contributionPreparation of structure-graded yttria film by laser CVD
Original languageJapanese
Pages (from-to)845-850
Number of pages6
JournalFuntai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy
Volume52
Issue number11
DOIs
Publication statusPublished - 2005 Nov 1

ASJC Scopus subject areas

  • Mechanical Engineering
  • Industrial and Manufacturing Engineering
  • Metals and Alloys
  • Materials Chemistry

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