Preparation of self-organized porous polymer masks for si dry etching

Yuji Hirai, Hiroshi Yabu, Yasutaka Matsuo, Kuniharu Ijiro, Masatsugu Shimomura

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Self-organized honeycomb-patterned polymer films were prepared by using condensed water droplet arrays as templates. Porous polymer masks for dry etching were easily prepared on Si substrates by peeling off the honeycombpatterned films. After dry etching, hexagonally-arranged micro-pores were formed on the surface of Si substrates.

Original languageEnglish
Pages (from-to)77-80
Number of pages4
JournalMacromolecular Symposia
Volume295
Issue number1
DOIs
Publication statusPublished - 2010 Sep

Keywords

  • Porous polymer mask
  • Self-organization
  • Silicon dry etching

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Organic Chemistry
  • Polymers and Plastics
  • Materials Chemistry

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