Preparation of self-organized porous polymer masks for si dry etching

Yuji Hirai, Hiroshi Yabu, Yasutaka Matsuo, Kuniharu Ijiro, Masatsugu Shimomura

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)


Self-organized honeycomb-patterned polymer films were prepared by using condensed water droplet arrays as templates. Porous polymer masks for dry etching were easily prepared on Si substrates by peeling off the honeycombpatterned films. After dry etching, hexagonally-arranged micro-pores were formed on the surface of Si substrates.

Original languageEnglish
Pages (from-to)77-80
Number of pages4
JournalMacromolecular Symposia
Issue number1
Publication statusPublished - 2010 Sep


  • Porous polymer mask
  • Self-organization
  • Silicon dry etching

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Organic Chemistry
  • Polymers and Plastics
  • Materials Chemistry


Dive into the research topics of 'Preparation of self-organized porous polymer masks for si dry etching'. Together they form a unique fingerprint.

Cite this