Preparation of self-organized mesoscale polymer patterns on a solid substrate: Continuous pattern formation from a receding meniscus

Hiroshi Yabu, Masatsugu Shimomura

Research output: Contribution to journalArticlepeer-review

174 Citations (Scopus)

Abstract

Regular polymer patterns are formed from casting a dilute polymer solution on a solid substrate. Dissipative structures, e.g., convection patterns, fingering instabilities, and so on, are formed in the evaporation process of casting polymer films. Controlled production and manufacturing of patterned polymer films can be achieved when the evaporating solution edge, especially the meniscus region on the casting substrate, is formed under controlled casting conditions. In this report, we describe a computer-controlled apparatus which has two precisely manipulated sliding glass plates. A narrow, thin liquid film of polymer solution with a receding meniscus is continuously supplied from a small gap between two glass plates (one sliding and the other stationary), and a patterned polymer film is subsequently formed on the stationary substrate from the evaporating solution edge. Several types of polymer patterns from various polymers are reproducibly prepared by changing preparation conditions such as sliding speed and polymer concentration.

Original languageEnglish
Pages (from-to)575-581
Number of pages7
JournalAdvanced Functional Materials
Volume15
Issue number4
DOIs
Publication statusPublished - 2005 Apr 1
Externally publishedYes

ASJC Scopus subject areas

  • Chemistry(all)
  • Materials Science(all)
  • Condensed Matter Physics

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