TiO2 thin films were prepared on Pt/Ti/SiO2/Si substrate by laser chemical vapor deposition (LCVD) method. The effects of laser power (PL) and total pressure (ptot) on the microstructure of TiO2 thin films were investigated. The deposition temperature (Tdep) was mainly affected by PL, increasing with PL increasing. The single-phase rutile TiO2 thin films with different morphologies were obtained. The morphologies of TiO2 thin films were classified into three typical types, including the powdery, Wulff-shaped and granular microstructures. ptot and Tdep were the two critical factors that could be effectively used for controlling the morphology of the films.
- laser chemical vapor deposition (LCVD)
- laser power
- rutile TiO thin film
- total pressure
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Ceramics and Composites