Preparation of PDMS membranes to permeate out Au-nanoparticles and permeation-blocking layers on the PDMS surface by photolithography

Motohiro Tagaya, Tomokazu Iyoda, Masaru Nakagawa

Research output: Contribution to conferencePaper

Abstract

In this study, we demonstrate that a toluene solution containing Au nanoparticles could seep site-selectively out of a cross-linked poly(dimethylsiloxane) (PDMS) membrane whose surface was modified with a perfluoroalkylsilane adsorption film in accordance with a photomask shape. We first confirmed that Au nanoparticles passed through the cross-linked PDMS membrane by UV-Visible spectroscopy. The permeability of Au nanoparticles could be controlled by a feed ratio of a cross-linking reagent to liquid PDMS. By exposure to vacuum ultraviolet (VUV) light at 172 nm, silanol groups were generated on the PDMS surface due to photooxidation and then modified with a perfluoroalkylsilane adsorption film. The adsorption film worked as a permeation-blocking layer, and consequently we could let the nanoparticle solution seep out of the unexposed surface of the PDMS membrane into a solid surface.

Original languageEnglish
Pages4263-4264
Number of pages2
Publication statusPublished - 2005 Dec 1
Externally publishedYes
Event54th SPSJ Symposium on Macromolecules - Yamagata, Japan
Duration: 2005 Sep 202005 Sep 22

Other

Other54th SPSJ Symposium on Macromolecules
CountryJapan
CityYamagata
Period05/9/2005/9/22

Keywords

  • Au nanoparticle
  • Ink-blocking layers
  • PDMS
  • Patterning
  • Printing

ASJC Scopus subject areas

  • Engineering(all)

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  • Cite this

    Tagaya, M., Iyoda, T., & Nakagawa, M. (2005). Preparation of PDMS membranes to permeate out Au-nanoparticles and permeation-blocking layers on the PDMS surface by photolithography. 4263-4264. Paper presented at 54th SPSJ Symposium on Macromolecules, Yamagata, Japan.