Preparation of Na-β-alumina films by laser chemical vapor deposition

Chen Chi, Hirokazu Katsui, Takashi Goto

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

This study demonstrates the growth of Na-β-alumina films by laser chemical vapor deposition and investigates the effects of deposition temperature (Tdep), molar ratio of Na/Al (RNa/Al) and total pressure (Ptot) on the phase formation, microstructure, orientations and deposition rate (Rdep) of the film. Single-phase Na-β-alumina films were deposited at (Tdep)=1310K-1360K, RNa/Al>20 and Ptot>600Pa. Na-β-alumina films with the hexagonally faceted platelet morphology were deposited at Ptot=1000Pa, whereas flake-like grains were formed at Ptot=600Pa. Na-β-alumina was co-deposited with α-Al2O3 at Ptot<600Pa and Tdep>1350K, in which the film morphology showed flake-like grains with smaller granules. The maximum Rdep of Na-β-alumina films was 44μmh-1.

Original languageEnglish
Pages (from-to)534-538
Number of pages5
JournalSurface and Coatings Technology
Volume276
DOIs
Publication statusPublished - 2015 Aug 25

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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