Preparation of Li-Co-O film by metal organic chemical vapor deposition

Hirokazu Katsui, Yuji Yamashita, Rong Tu, Takashi Goto

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)


LiCoO2 films were prepared on polycrystalline Al 2O3 substrates by metal organic chemical vapor deposition (MOCVD), and the effect of the Li to Co source vapor ratio (RLi/Co) and substrate temperature (Tsub) on the phases, orientation, morphology, and deposition rates were investigated. At RLi/Co < 2.0, Li2CO3, LixCo1-xO, and a LiCoO 2-CoO solid solution were co-deposited with LiCoO2, whereas Co3O4 was co-deposited with LiCoO2 at RLi/Co < 0.7. Single-phase LiCoO2 films were obtained in the RLi/Co range of 0.7-2.0 at Tsub > 873 K. Rutherford backscattering spectrometry revealed that single-phase LiCoO 2 film had uniform and stoichiometric composition. The orientation of single-phase LiCoO2 films changed from (003) to (104) and (012) with increasing Tsub at RLi/Co ∼ 1.0. LiCoO2 film co-deposited with Co3O4 at RLi/Co = 0.4 showed significant (101) orientation. The (003)-oriented LiCoO2 had a flat surface with hexagonal faceted texture, whereas the (101)- and (104)-oriented LiCoO2 had platelet grains in which the plate faces were tilted relative to the substrate surface. The highest deposition rate of single-phase LiCoO2 film was 10-20 μmh-1, which was 100 times greater than that reported in the literature.

Original languageEnglish
Pages (from-to)406-410
Number of pages5
JournalJournal of the Ceramic Society of Japan
Issue number1413
Publication statusPublished - 2013 May


  • Deposition rate
  • Orientation

ASJC Scopus subject areas

  • Ceramics and Composites
  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry


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