Preparation of Li-Co-O film by metal organic chemical vapor deposition

Hirokazu Katsui, Yuji Yamashita, Rong Tu, Takashi Goto

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

LiCoO2 films were prepared on polycrystalline Al 2O3 substrates by metal organic chemical vapor deposition (MOCVD), and the effect of the Li to Co source vapor ratio (RLi/Co) and substrate temperature (Tsub) on the phases, orientation, morphology, and deposition rates were investigated. At RLi/Co < 2.0, Li2CO3, LixCo1-xO, and a LiCoO 2-CoO solid solution were co-deposited with LiCoO2, whereas Co3O4 was co-deposited with LiCoO2 at RLi/Co < 0.7. Single-phase LiCoO2 films were obtained in the RLi/Co range of 0.7-2.0 at Tsub > 873 K. Rutherford backscattering spectrometry revealed that single-phase LiCoO 2 film had uniform and stoichiometric composition. The orientation of single-phase LiCoO2 films changed from (003) to (104) and (012) with increasing Tsub at RLi/Co ∼ 1.0. LiCoO2 film co-deposited with Co3O4 at RLi/Co = 0.4 showed significant (101) orientation. The (003)-oriented LiCoO2 had a flat surface with hexagonal faceted texture, whereas the (101)- and (104)-oriented LiCoO2 had platelet grains in which the plate faces were tilted relative to the substrate surface. The highest deposition rate of single-phase LiCoO2 film was 10-20 μmh-1, which was 100 times greater than that reported in the literature.

Original languageEnglish
Pages (from-to)406-410
Number of pages5
JournalJournal of the Ceramic Society of Japan
Volume121
Issue number1413
DOIs
Publication statusPublished - 2013 May

Keywords

  • Deposition rate
  • Orientation

ASJC Scopus subject areas

  • Ceramics and Composites
  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Chemistry

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