Preparation of layered-rhombohedral LiCoO2 epitaxial thin films using pulsed laser deposition

Tetsukazu Tsuruhama, Taro Hitosugi, Hideki Oki, Yasushi Hirose, Tetsuya Hasegawa

Research output: Contribution to journalArticlepeer-review

34 Citations (Scopus)

Abstract

Epitaxial thin films of layered-rhombohedral LiCoO2 (α-NaFeO2 structure, R3m) have been successfully grown on Al2O3(0001) substrates using pulsed laser deposition. A single phase of LiCoO2 was obtained in the narrow substrate temperature range of 250-300°C, above which secondary phases, such as Co2O3,Co3O4, and LiCo 2O4, appeared. In addition, it was found that annealing of precursor films deposited at room temperature yielded atomically flat LiCoO2 films with a surface roughness of ∼0.2 nm.

Original languageEnglish
Article number085502
JournalApplied Physics Express
Volume2
Issue number8
DOIs
Publication statusPublished - 2009 Aug
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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