Abstract
Ca-P-O films were prepared by MOCVD using Ca(dpm)2 and (C 6H5O)3PO precursors. The crystal phase changed with changing deposition conditions of substrate temperature (Tsub), total pressure (Ptot) and molar ratio of Ca and P precursors (R Ca/P). α-tricalcium phosphate (γ-Ca3(PO 4)2) in a single phase was obtained at Ysub = 973K, RCa/P < 0.3 and Tsub = 1073K, RCa/P = 0.1 to 0.5. Hydroxyapatite (Ca10(PO4)6(OH) 2) in a single phase was first prepared by MOCVD at Tsub = 973 K, RCa/P = 0.5 and Tsub = 1073 K, RCa/P = 0.8 to 1. The maximum deposition rate of α-TCP and HAp films in a single phase were 6.0 and 4.0nms-1 at Pwt = 0.8 kPa and T sub = 1073 K, respectively.
Original language | English |
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Pages (from-to) | 3149-3153 |
Number of pages | 5 |
Journal | Materials Transactions |
Volume | 48 |
Issue number | 12 |
DOIs | |
Publication status | Published - 2007 Dec |
Keywords
- Crystal structure
- Deposition rate
- Metal-organic chemical vapor deposition, calcium phosphate
- Microstructure
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Mechanics of Materials
- Mechanical Engineering