Abstract
CeO2 films were prepared on Al2O3 substrates by laser chemical vapor deposition at different laser power (PL) up to 182W. The (100)-oriented CeO2 films were prepared at PL=101-167W (Tdep=792-945K). The texture coefficient (TC) of (200) reflection had a maximum of 6.7 at PL=113W (Tdep=836K). The (100)-oriented CeO2 films consisted of granular grains and showed a columnar cross section. The deposition rates (Rdep) of (100)-oriented CeO2 films showed a maximum of 43μmh-1 at PL=152W (Tdep=912K).
Original language | English |
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Pages (from-to) | 3619-3622 |
Number of pages | 4 |
Journal | Surface and Coatings Technology |
Volume | 204 |
Issue number | 21-22 |
DOIs | |
Publication status | Published - 2010 Aug |
Keywords
- CeO film
- High deposition rate
- Laser chemical vapor deposition
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry