Preparation of high purity metals for advanced devices

Minoru Isshiki, Kouji Mimura, Masahito Uchikoshi

Research output: Contribution to journalArticlepeer-review

11 Citations (Scopus)

Abstract

The purity is one of the essential factors of the materials for preparing well controlled materials and devices, because the existence of ppm or sub-ppm level impurities leads to a significant and sometimes critical influence on the material properties and devise performance. Since the development of high technology depends strongly on the availability of high purity metals required for fabricating a new functional device, and furthermore, the purity of commercial pure materials for exploratory material researches is insufficient, the purification process that meets any requirements should be developed. In this article, based on our experience, we will describe how to construct the purification process, purification methods, and the purification of iron as an example.

Original languageEnglish
Pages (from-to)8451-8455
Number of pages5
JournalThin Solid Films
Volume519
Issue number24
DOIs
Publication statusPublished - 2011 Oct 3

Keywords

  • Anion-exchange separation
  • Glow discharge mass spectrometry
  • High purity metals
  • Hydrogen plasma arc melting

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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