Mixed phase boron nitride thin films, including c-BN, h-BN, w-BN, and E-BN phases, were deposited on the metallic substrates by tuned substrate rf magnetron sputtering. TEM revealed that the surface of the film is pure c-BN. The infrared peak position of c-BN at 1006.3 cm-1 showed that the film has low stress. The growth mechanism of the c-BN layer was established based on the dependence of the IR spectra on the deposition time. With time increasing, E-BN was formed first and then w-BN appeared and finally c-BN was grown on the surface.
|Number of pages||3|
|Journal||Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films|
|Publication status||Published - 2002 May 1|
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films