Preparation of cubic and tetragonal Li7La3Zr2O12 film by metal organic chemical vapor deposition

H. Katsui; T. Goto

doi:10.1016/j.tsf.2014.11.094

Preparation of cubic and tetragonal Li₇La₃Zr₂O₁₂ film by metal organic chemical vapor deposition

H. Katsui, T. Goto

Research output: Contribution to journal › Article › peer-review

34 Citations (Scopus)

Abstract

Li₇La₃Zr₂O₁₂ films were prepared on polycrystalline Al₂O₃ by metal organic chemical vapor deposition. The effect of deposition temperature (T_sub) on the phase formation, morphology and deposition rates was investigated. Tetragonal Li₇La₃Zr₂O₁₂ film formed at T_sub = 1023-1173 K. The morphology changed from small-sized granular, polygonally faceted granular to flat and smooth surface with increasing T_sub. Cubic Li₇La₃Zr₂O₁₂ film with fine granular surface was deposited at T_sub = 1173-1223 K. The deposition rates of the cubic and tetragonal Li₇La₃Zr₂O₁₂ films were approximately 20 μm h^{- 1}, which were one to two orders of magnitude greater than those of Li₇La₃Zr₂O₁₂ films by pulsed laser deposition.

Original language	English
Pages (from-to)	130-134
Number of pages	5
Journal	Thin Solid Films
Volume	584
DOIs	https://doi.org/10.1016/j.tsf.2014.11.094
Publication status	Published - 2015 Jun 1

Keywords

Cubic structure
Deposition rate
Lanthanum zirconate
Lithium lanthanum zirconate
Metal organic chemical vapor deposition
Tetragonal structure

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

Access to Document

10.1016/j.tsf.2014.11.094

Fingerprint Dive into the research topics of 'Preparation of cubic and tetragonal Li7La3Zr2O12 film by metal organic chemical vapor deposition'. Together they form a unique fingerprint.

Cite this

@article{7a49042829f841ada1444e1451a0f7ab,

title = "Preparation of cubic and tetragonal Li7La3Zr2O12 film by metal organic chemical vapor deposition",

abstract = "Li7La3Zr2O12 films were prepared on polycrystalline Al2O3 by metal organic chemical vapor deposition. The effect of deposition temperature (Tsub) on the phase formation, morphology and deposition rates was investigated. Tetragonal Li7La3Zr2O12 film formed at Tsub = 1023-1173 K. The morphology changed from small-sized granular, polygonally faceted granular to flat and smooth surface with increasing Tsub. Cubic Li7La3Zr2O12 film with fine granular surface was deposited at Tsub = 1173-1223 K. The deposition rates of the cubic and tetragonal Li7La3Zr2O12 films were approximately 20 μm h- 1, which were one to two orders of magnitude greater than those of Li7La3Zr2O12 films by pulsed laser deposition.",

keywords = "Cubic structure, Deposition rate, Lanthanum zirconate, Lithium lanthanum zirconate, Metal organic chemical vapor deposition, Tetragonal structure",

author = "H. Katsui and T. Goto",

note = "Funding Information: We thank K. Omura for her technical help in the XPS measurements. This work was supported by a Grant-in-Aid for Challenging Exploratory Research (No. 26560235 ) of the Ministry of Education, Culture, Sports, Science, and Technology (MEXT) and the cooperative program of the ARCMG-IMR (No. 14G0402 ), Tohoku University. The authors also acknowledge the financial support by Toyota Motor Corporation . Publisher Copyright: {\textcopyright} 2015 Elsevier B.V.",

year = "2015",

month = jun,

day = "1",

doi = "10.1016/j.tsf.2014.11.094",

language = "English",

volume = "584",

pages = "130--134",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier",

}

TY - JOUR

T1 - Preparation of cubic and tetragonal Li7La3Zr2O12 film by metal organic chemical vapor deposition

AU - Katsui, H.

AU - Goto, T.

N1 - Funding Information: We thank K. Omura for her technical help in the XPS measurements. This work was supported by a Grant-in-Aid for Challenging Exploratory Research (No. 26560235 ) of the Ministry of Education, Culture, Sports, Science, and Technology (MEXT) and the cooperative program of the ARCMG-IMR (No. 14G0402 ), Tohoku University. The authors also acknowledge the financial support by Toyota Motor Corporation . Publisher Copyright: © 2015 Elsevier B.V.

PY - 2015/6/1

Y1 - 2015/6/1

N2 - Li7La3Zr2O12 films were prepared on polycrystalline Al2O3 by metal organic chemical vapor deposition. The effect of deposition temperature (Tsub) on the phase formation, morphology and deposition rates was investigated. Tetragonal Li7La3Zr2O12 film formed at Tsub = 1023-1173 K. The morphology changed from small-sized granular, polygonally faceted granular to flat and smooth surface with increasing Tsub. Cubic Li7La3Zr2O12 film with fine granular surface was deposited at Tsub = 1173-1223 K. The deposition rates of the cubic and tetragonal Li7La3Zr2O12 films were approximately 20 μm h- 1, which were one to two orders of magnitude greater than those of Li7La3Zr2O12 films by pulsed laser deposition.

AB - Li7La3Zr2O12 films were prepared on polycrystalline Al2O3 by metal organic chemical vapor deposition. The effect of deposition temperature (Tsub) on the phase formation, morphology and deposition rates was investigated. Tetragonal Li7La3Zr2O12 film formed at Tsub = 1023-1173 K. The morphology changed from small-sized granular, polygonally faceted granular to flat and smooth surface with increasing Tsub. Cubic Li7La3Zr2O12 film with fine granular surface was deposited at Tsub = 1173-1223 K. The deposition rates of the cubic and tetragonal Li7La3Zr2O12 films were approximately 20 μm h- 1, which were one to two orders of magnitude greater than those of Li7La3Zr2O12 films by pulsed laser deposition.

KW - Cubic structure

KW - Deposition rate

KW - Lanthanum zirconate

KW - Lithium lanthanum zirconate

KW - Metal organic chemical vapor deposition

KW - Tetragonal structure

UR - http://www.scopus.com/inward/record.url?scp=84928600638&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84928600638&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2014.11.094

DO - 10.1016/j.tsf.2014.11.094

M3 - Article

AN - SCOPUS:84928600638

VL - 584

SP - 130

EP - 134

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

ER -