Preparation of calcium phosphate films by radiofrequency magnetron sputtering

Takayuki Narushima, Kyosuke Ueda, Takashi Goto, Hiroshi Masumoto, Tomoyuki Katsube, Hiroshi Kawamura, Chiaki Ouchi, Yasutaka Iguchi

Research output: Contribution to journalArticle

55 Citations (Scopus)

Abstract

Calcium phosphate films were prepared on titanium substrates by radiofrequency (RF) magnetron sputtering at RF powers from 75 to 150 W. Hot-pressed β-tricalcium phosphate (β-TCP) plates with a high density (>99.6%) were used as a sputtering target. The substrate was not intentionally heated. The films consisted of amorphous calcium phosphate and oxyapatite (Ca 10(PO 4) 6O) phases. The ratio of the oxyapatite phase depended on the sputtering conditions of RF power, oxygen gas concentration in the sputtering gas (CO 2) and total pressure in the chamber. The (002) preferred orientation of oxyapatite phase was observed. The deposition rate of films increased with increasing RF power and decreasing Co 2. The highest deposition rate was 0.143 nm·s -1 (0.515 μm -1).

Original languageEnglish
Pages (from-to)2246-2252
Number of pages7
JournalMaterials Transactions
Volume46
Issue number10
DOIs
Publication statusPublished - 2005 Oct 1

Keywords

  • Biomaterials
  • Calcium phosphate
  • Oxyapatite
  • Sputtering
  • Titanium

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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