Preparation of calcium phosphate films by radiofrequency magnetron sputtering

Takayuki Narushima; Kyosuke Ueda; Takashi Goto; Hiroshi Masumoto; Tomoyuki Katsube; Hiroshi Kawamura; Chiaki Ouchi; Yasutaka Iguchi

doi:10.2320/matertrans.46.2246

Preparation of calcium phosphate films by radiofrequency magnetron sputtering

Takayuki Narushima, Kyosuke Ueda, Takashi Goto, Hiroshi Masumoto, Tomoyuki Katsube, Hiroshi Kawamura, Chiaki Ouchi, Yasutaka Iguchi

Research output: Contribution to journal › Article › peer-review

58 Citations (Scopus)

Abstract

Calcium phosphate films were prepared on titanium substrates by radiofrequency (RF) magnetron sputtering at RF powers from 75 to 150 W. Hot-pressed β-tricalcium phosphate (β-TCP) plates with a high density (>99.6%) were used as a sputtering target. The substrate was not intentionally heated. The films consisted of amorphous calcium phosphate and oxyapatite (Ca ₁₀(PO ₄) ₆O) phases. The ratio of the oxyapatite phase depended on the sputtering conditions of RF power, oxygen gas concentration in the sputtering gas (CO ₂) and total pressure in the chamber. The (002) preferred orientation of oxyapatite phase was observed. The deposition rate of films increased with increasing RF power and decreasing Co ₂. The highest deposition rate was 0.143 nm·s ^-1 (0.515 μm ^-1).

Original language	English
Pages (from-to)	2246-2252
Number of pages	7
Journal	Materials Transactions
Volume	46
Issue number	10
DOIs	https://doi.org/10.2320/matertrans.46.2246
Publication status	Published - 2005 Oct

Keywords

Biomaterials
Calcium phosphate
Oxyapatite
Sputtering
Titanium

ASJC Scopus subject areas

Materials Science(all)
Condensed Matter Physics
Mechanics of Materials
Mechanical Engineering

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title = "Preparation of calcium phosphate films by radiofrequency magnetron sputtering",

abstract = "Calcium phosphate films were prepared on titanium substrates by radiofrequency (RF) magnetron sputtering at RF powers from 75 to 150 W. Hot-pressed β-tricalcium phosphate (β-TCP) plates with a high density (>99.6%) were used as a sputtering target. The substrate was not intentionally heated. The films consisted of amorphous calcium phosphate and oxyapatite (Ca 10(PO 4) 6O) phases. The ratio of the oxyapatite phase depended on the sputtering conditions of RF power, oxygen gas concentration in the sputtering gas (CO 2) and total pressure in the chamber. The (002) preferred orientation of oxyapatite phase was observed. The deposition rate of films increased with increasing RF power and decreasing Co 2. The highest deposition rate was 0.143 nm·s -1 (0.515 μm -1).",

keywords = "Biomaterials, Calcium phosphate, Oxyapatite, Sputtering, Titanium",

author = "Takayuki Narushima and Kyosuke Ueda and Takashi Goto and Hiroshi Masumoto and Tomoyuki Katsube and Hiroshi Kawamura and Chiaki Ouchi and Yasutaka Iguchi",

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T1 - Preparation of calcium phosphate films by radiofrequency magnetron sputtering

AU - Narushima, Takayuki

AU - Ueda, Kyosuke

AU - Goto, Takashi

AU - Masumoto, Hiroshi

AU - Katsube, Tomoyuki

AU - Kawamura, Hiroshi

AU - Ouchi, Chiaki

AU - Iguchi, Yasutaka

PY - 2005/10

Y1 - 2005/10

N2 - Calcium phosphate films were prepared on titanium substrates by radiofrequency (RF) magnetron sputtering at RF powers from 75 to 150 W. Hot-pressed β-tricalcium phosphate (β-TCP) plates with a high density (>99.6%) were used as a sputtering target. The substrate was not intentionally heated. The films consisted of amorphous calcium phosphate and oxyapatite (Ca 10(PO 4) 6O) phases. The ratio of the oxyapatite phase depended on the sputtering conditions of RF power, oxygen gas concentration in the sputtering gas (CO 2) and total pressure in the chamber. The (002) preferred orientation of oxyapatite phase was observed. The deposition rate of films increased with increasing RF power and decreasing Co 2. The highest deposition rate was 0.143 nm·s -1 (0.515 μm -1).

AB - Calcium phosphate films were prepared on titanium substrates by radiofrequency (RF) magnetron sputtering at RF powers from 75 to 150 W. Hot-pressed β-tricalcium phosphate (β-TCP) plates with a high density (>99.6%) were used as a sputtering target. The substrate was not intentionally heated. The films consisted of amorphous calcium phosphate and oxyapatite (Ca 10(PO 4) 6O) phases. The ratio of the oxyapatite phase depended on the sputtering conditions of RF power, oxygen gas concentration in the sputtering gas (CO 2) and total pressure in the chamber. The (002) preferred orientation of oxyapatite phase was observed. The deposition rate of films increased with increasing RF power and decreasing Co 2. The highest deposition rate was 0.143 nm·s -1 (0.515 μm -1).

KW - Biomaterials

KW - Calcium phosphate

KW - Oxyapatite

KW - Sputtering

KW - Titanium

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Preparation of calcium phosphate films by radiofrequency magnetron sputtering

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Keywords

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