Abstract
Ca-Si-O films were prepared by chemical vapor deposition using calcium dipivaloylmethanates (Ca(dpm)2) and tetraethyl orthosilicate (TEOS). The effects of the Si to Ca precursor molar ratio (RSi/Ca) and the substrate temperature (Tsub) on the crystal phase, microstructure and deposition rate of Ca-Si-O films were investigated. Three main phases, i.e., CaSiO3, Ca2SiO4 and Ca3SiO5, were obtained along with the CaO and amorphous phases. At Tsub=923 to 1023K and RSi/Ca=49, Ca2SiO4 film in a single phase was obtained. The microstructure was granular and changed from a cauliflower-like to a granular type with increasing RSi/Ca. The maximum deposition rate was 240μmh-1 at Tsub=1323K and RSi/Ca=29.
Original language | English |
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Pages (from-to) | 2618-2623 |
Number of pages | 6 |
Journal | Surface and Coatings Technology |
Volume | 205 |
Issue number | 7 |
DOIs | |
Publication status | Published - 2010 Dec 25 |
Keywords
- CVD
- Calcium silicate
- Crystal phase
- Deposition rate
- Microstructure
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry