Preparation of Ba2NaNb5O15 thin films by electron cyclotron resonance plasma sputter method and their properties

Akira Watazu, Hiroshi Masumoto, Yoichiro Masuda, Akira Baba, Takashi Goto, Yoshio Hirai

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

Ba-Na-Nb-O thin films were formed on sapphire (1120) substrates by electron cyclotron resonance plasma sputtering by using ring shaped targets. A Ba2NaNb5O15 (BNN) thin film of single phase was obtained, at the substrate temperature of 873 K by using the target composition of Ba:Na:Nb = 1.0:1.0:5.0. The (001) oriented BNN film was successfully obtained at 923 K. The contents of Ba and Nb in the films were independent of substrate temperature in the range between 298 K and 923 K. However, Na content decreased with increasing substrate temperature. Deposition rates of the BNN thin films were estimated to be about 1.0X10-1 nm/s. The absorption edge of the BNN films deposited at 923 K became clear in the vacinity of 300 nm. The transmittance in the wavelength between 700 and 2000 nm have exceedingly by more than 80 %. The refractive index of the film was estimated about 2.07 at 627 nm.

Original languageEnglish
Pages (from-to)86-89
Number of pages4
JournalFuntai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy
Volume44
Issue number1
DOIs
Publication statusPublished - 1997 Jan

Keywords

  • BaNaNbO
  • Electron cyclotron resonance plasma sputtering
  • Refractive index
  • Thin film
  • Transmittance

ASJC Scopus subject areas

  • Mechanical Engineering
  • Industrial and Manufacturing Engineering
  • Metals and Alloys
  • Materials Chemistry

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