Preparation of barium titanate film by metal-organic chemical vapor deposition and its thermodynamic analysis

T. Tohma, H. Masumoto, T. Hirai, T. Goto

Research output: Contribution to journalArticlepeer-review

3 Citations (Scopus)

Abstract

BaTiO3 films were prepared on fused silica substrates by metal-organic chemical vapor deposition (MOCVD). Effect of deposition conditions on the composition, structure and morphology were studied. Thermodynamic calculations well predicted the relationship between deposition conditions and the phases of deposits. BaTiO3 films in a single phase were obtained at 973 K and Ba/Ti ratio in the source gas of 0.25 to 0.35. The grain size of BaTiO3 films increased with decreasing total pressure. BaTiO3 film in thickness of about 1 μm had a relative dielectric constant of 480. The dielectric constant of the BaTiO3 film showed the maximum value of 530 at 360 K.

Original languageEnglish
Pages (from-to)702-706
Number of pages5
JournalMaterials Transactions
Volume42
Issue number4
DOIs
Publication statusPublished - 2001

Keywords

  • Barium titanate
  • Dielectric constant
  • Metal-organic chemical vapor deposition
  • Thermodynamic analysis
  • Thin film

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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