Preparation of atomically flat TiO2(110) substrate

Ryota Shimizu, Taro Hitosugi, Koji S. Nakayama, Toshio Sakurai, Manabu Shiraiwa, Tetsuya Hasegawa, Tomihiro Hashizume

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)


The temperature dependence of step/terrace surfaces of rutile TiO 2(110) substrates, prepared by chemical etching and thermal annealing, was examined by scanning tunneling microscopy, low-energy electron diffraction, and Auger electron spectroscopy in ultrahigh vacuum. Whereas disordered step/terrace structures appeared when the sample was heated at temperatures in the range 675-850 °C, we have succeeded in obtaining atomically flat and clean TiO2(110) (1 × 1) surfaces following annealing at 900 °C. Additional heating of the atomically-ordered surfaces at lower temperatures induced no structural changes. This simple approach is an important starting point for the further growth of oxide epitaxial layers.

Original languageEnglish
Article number125506
JournalJapanese journal of applied physics
Issue number12
Publication statusPublished - 2009 Dec

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


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