Preparation of an epitaxy-ready surface of a ZnO(0001) substrate

Shunsuke Akasaka, Ken Nakahara, Hiroyuki Yuji, Atsushi Tsukazaki, Akira Ohtomo, Masashi Kawasaki

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)

Abstract

We show that there can be a contamination of silica particles on the surface of chemo-mechanically polished ZnO substrates. Consideration of the base of electrochemistry led us to a hypothesis that the alkaline polishing solution produces a layer of Zn(OH)2 capturing silica particles. In-situ observation of the etching process in an acidic solution by means of an atomic force microscope as well as zeta potential measurements supports this hypothesis and gives a clear guidance to solve the problem. We find that an epitaxy-ready surface can be reproducibly prepared by dipping ZnO substrates in an HCl solution (HCl : H2O = 7 : 200) for 30 s.

Original languageEnglish
Article number035701
JournalApplied Physics Express
Volume4
Issue number3
DOIs
Publication statusPublished - 2011 Mar

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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