Preparation of γ-Al2O3 films by laser chemical vapor deposition

Ming Gao, Akihiko Ito, Takashi Goto

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

γ- and α-Al2O3 films were prepared by chemical vapor deposition using CO2, Nd:YAG, and InGaAs lasers to investigate the effects of varying the laser wavelength and deposition conditions on the phase composition and microstructure. The CO2 laser was found to mostly produce α-Al2O3 films, whereas the Nd:YAG and InGaAs lasers produced γ-Al2O3 films when used at a high total pressure. γ-Al2O3 films had a cauliflower-like structure, while the α-Al2O3 films had a dense and columnar structure. Of the three lasers, it was the Nd:YAG laser that interacted most with intermediate gas species. This promoted γ-Al2O3 nucleation in the gas phase at high total pressure, which explains the cauliflower-like structure of nanoparticles observed.

Original languageEnglish
Pages (from-to)160-165
Number of pages6
JournalApplied Surface Science
Volume340
DOIs
Publication statusPublished - 2015 Jun 15

Keywords

  • Film
  • Laser CVD
  • Microstructure
  • α-AlO
  • γ-AlO

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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