Preparation conditions of CaTiO3 film by metal-organic chemical vapor deposition

Mitsutaka Sato, Rong Tu, Takashi Goto

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

Calcium titanate (CaTiO3) films were prepared by metal-organic chemical vapor deposition (MOCVD) using Ca(dpm)2 and Ti(O-iPr) 2(dpm)2 precursors. The phases, composition and morphology of Ca-Ti-O system films changed depending on molar ratio of Ca to Ti (R Ca/Ti). total pressure (Ptot) and substrate temperature (Tsub). CaTiO3 films in a single phase were obtained at the condition of RCa/Ti = 0.95, Tsub = 1073 K and P tot =0.8 kPa, and ACa/Ti = 0.78, Tsub = 973 K and Ptot =0.8 kPa. The CaTiO3 films prepared at T sub = 1073 K had a welldeveloped columnar texture, and significant (010) orientation was observed at RCa/Ti from 0.59 to 0.72. The deposition rate showed the highest value of 1.25 × 10-8 ms -1 at Tsub = 1073 K, Ptot, = 0.4 kPa and R Ca/Ti = 0.95.

Original languageEnglish
Pages (from-to)1386-1390
Number of pages5
JournalMaterials Transactions
Volume47
Issue number5
DOIs
Publication statusPublished - 2006 May 1

Keywords

  • CaTiO. crystal structure
  • Deposition rate
  • Metal-organic chemical vapor deposition
  • Microstructure

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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