Abstract
SiO2-coated SiC powders were prepared via rotary chemical vapor deposition and consolidated by spark plasma sintering. Thin amorphous SiO2 layers were deposited uniformly on SiC powders at 948 K at deposition time from 2.7 to 7.2 ks. The resultant SiO2-coated SiC powders were sintered, and the effects of the sintering temperature on the phase, morphology, relative density, and mechanical property were investigated. The SiO2-coated SiC sintered body fabricated at 1923 K was nearly fully densified, with a mosaic structure consisting of small SiC particles and a thin SiO2 matrix, and exhibited high hardness (HV = 17.1 GPa) and toughness (KIC = 8.4 MPa m1/2).
Original language | English |
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Pages (from-to) | 111-116 |
Number of pages | 6 |
Journal | Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy |
Volume | 63 |
Issue number | 3 |
DOIs | |
Publication status | Published - 2016 Mar |
Keywords
- Chemical vapor deposition
- Hardness
- Silicon carbide
- Spark plasma sintering
- Toughness
ASJC Scopus subject areas
- Mechanical Engineering
- Industrial and Manufacturing Engineering
- Metals and Alloys
- Materials Chemistry