Preparation and sintering of silica-coated silicon carbide composite powder

Hirokazu Katsui; Zhenhua He; Takashi Goto

doi:10.2497/jjspm.63.111

Preparation and sintering of silica-coated silicon carbide composite powder

Hirokazu Katsui, Zhenhua He, Takashi Goto

Materials Processing and Characterization Division

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

SiO₂-coated SiC powders were prepared via rotary chemical vapor deposition and consolidated by spark plasma sintering. Thin amorphous SiO₂ layers were deposited uniformly on SiC powders at 948 K at deposition time from 2.7 to 7.2 ks. The resultant SiO₂-coated SiC powders were sintered, and the effects of the sintering temperature on the phase, morphology, relative density, and mechanical property were investigated. The SiO₂-coated SiC sintered body fabricated at 1923 K was nearly fully densified, with a mosaic structure consisting of small SiC particles and a thin SiO₂ matrix, and exhibited high hardness (H_V = 17.1 GPa) and toughness (K_IC = 8.4 MPa m^1/2).

Original language	English
Pages (from-to)	111-116
Number of pages	6
Journal	Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy
Volume	63
Issue number	3
DOIs	https://doi.org/10.2497/jjspm.63.111
Publication status	Published - 2016 Mar

Keywords

Chemical vapor deposition
Hardness
Silicon carbide
Spark plasma sintering
Toughness

ASJC Scopus subject areas

Mechanical Engineering
Industrial and Manufacturing Engineering
Metals and Alloys
Materials Chemistry

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10.2497/jjspm.63.111

Cite this

@article{3bb171f9fb0145d9b769f366e40508ac,

title = "Preparation and sintering of silica-coated silicon carbide composite powder",

abstract = "SiO2-coated SiC powders were prepared via rotary chemical vapor deposition and consolidated by spark plasma sintering. Thin amorphous SiO2 layers were deposited uniformly on SiC powders at 948 K at deposition time from 2.7 to 7.2 ks. The resultant SiO2-coated SiC powders were sintered, and the effects of the sintering temperature on the phase, morphology, relative density, and mechanical property were investigated. The SiO2-coated SiC sintered body fabricated at 1923 K was nearly fully densified, with a mosaic structure consisting of small SiC particles and a thin SiO2 matrix, and exhibited high hardness (HV = 17.1 GPa) and toughness (KIC = 8.4 MPa m1/2).",

keywords = "Chemical vapor deposition, Hardness, Silicon carbide, Spark plasma sintering, Toughness",

author = "Hirokazu Katsui and Zhenhua He and Takashi Goto",

year = "2016",

month = mar,

doi = "10.2497/jjspm.63.111",

language = "English",

volume = "63",

pages = "111--116",

journal = "Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy",

issn = "0532-8799",

publisher = "Funtai Funamtsu Yakin Kyokai/Japan Soc. of Powder Metallurgy",

number = "3",

}

TY - JOUR

T1 - Preparation and sintering of silica-coated silicon carbide composite powder

AU - Katsui, Hirokazu

AU - He, Zhenhua

AU - Goto, Takashi

PY - 2016/3

Y1 - 2016/3

N2 - SiO2-coated SiC powders were prepared via rotary chemical vapor deposition and consolidated by spark plasma sintering. Thin amorphous SiO2 layers were deposited uniformly on SiC powders at 948 K at deposition time from 2.7 to 7.2 ks. The resultant SiO2-coated SiC powders were sintered, and the effects of the sintering temperature on the phase, morphology, relative density, and mechanical property were investigated. The SiO2-coated SiC sintered body fabricated at 1923 K was nearly fully densified, with a mosaic structure consisting of small SiC particles and a thin SiO2 matrix, and exhibited high hardness (HV = 17.1 GPa) and toughness (KIC = 8.4 MPa m1/2).

AB - SiO2-coated SiC powders were prepared via rotary chemical vapor deposition and consolidated by spark plasma sintering. Thin amorphous SiO2 layers were deposited uniformly on SiC powders at 948 K at deposition time from 2.7 to 7.2 ks. The resultant SiO2-coated SiC powders were sintered, and the effects of the sintering temperature on the phase, morphology, relative density, and mechanical property were investigated. The SiO2-coated SiC sintered body fabricated at 1923 K was nearly fully densified, with a mosaic structure consisting of small SiC particles and a thin SiO2 matrix, and exhibited high hardness (HV = 17.1 GPa) and toughness (KIC = 8.4 MPa m1/2).

KW - Chemical vapor deposition

KW - Hardness

KW - Silicon carbide

KW - Spark plasma sintering

KW - Toughness

UR - http://www.scopus.com/inward/record.url?scp=84963811966&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84963811966&partnerID=8YFLogxK

U2 - 10.2497/jjspm.63.111

DO - 10.2497/jjspm.63.111

M3 - Article

AN - SCOPUS:84963811966

VL - 63

SP - 111

EP - 116

JO - Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy

JF - Funtai Oyobi Fummatsu Yakin/Journal of the Japan Society of Powder and Powder Metallurgy

SN - 0532-8799

IS - 3

ER -

Preparation and sintering of silica-coated silicon carbide composite powder

Abstract

Keywords

ASJC Scopus subject areas

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