PREPARATION AND RESOLUTION CHARACTERISTICS OF A NOVEL SILICON BASED NEGATIVE RESIST.

Akinobu Tanaka, Masao Morita, Saburo Imamura, Toshiaki Tamamura, Osamu Kogure

Research output: Contribution to journalConference articlepeer-review

3 Citations (Scopus)
Original languageEnglish
Pages (from-to)309-310
Number of pages2
JournalAmerican Chemical Society, Polymer Preprints, Division of Polymer Chemistry
Volume25
Issue number1
Publication statusPublished - 1984 Apr 1
Externally publishedYes

ASJC Scopus subject areas

  • Polymers and Plastics

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