Preparation and magnetic properties of Fe-N thin films by the plasma evaporation method

T. Tanaka, E. Fujita, M. Takahashi, T. Wakiyama, W. Ohta, M. Kinoshita

Research output: Contribution to journalArticle

Abstract

The saturation magnetization, Ms, of films evaporated in an N2 atmosphere and in N2 plasma was investigated. Films deposited by evaporation in an N2 atmosphere using an alumina crucible as the evaporation source had nearly the same Ms value (approximately 210/g) as pure Fe and were found by X-ray diffraction to contain no iron nitrides. The N, N2+, and N2*, were produced by plasma evaporation, an electron beam from an E-gun, and catalysis on a tungsten filament. The N, N2+, or N2* is necessary to obtain Fe-N films. The Ms of these films, which were deposited in a weak plasma and at a low deposition rate, increased with decreasing film thickness. The high-moment phase Fe16N2 could be produced when low density N, N2+, and N2* existed in the reactive gas atmosphere and when the film thickness was smaller than about 500 angstrom.

Original languageEnglish
Pages (from-to)35-44
Number of pages10
JournalIEEE translation journal on magnetics in Japan
Volume6
Issue number1
DOIs
Publication statusPublished - 1991 Jan

ASJC Scopus subject areas

  • Engineering(all)

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