Preoxide-controlled oxidation for very thin oxide films

Koji Makihara, Akinobu Teramoto, Kou Nakamura, Myoung Youn Kwon, Mizuho Morita, Tadahiro Ohmi

Research output: Contribution to journalArticlepeer-review

19 Citations (Scopus)


Very thin oxide films with high insulating performance and high reliability are formed by controlling preoxide growth with an ultraclean oxidation method during heating of the wafer to thermal oxidation temperature. The current level through the preoxide-controlled ultraclean oxide is lower than that through the oxide incorporating a thicker preoxide, and the preoxide-controlled ultraclean oxide has high reliability with respect to hot electron injection.

Original languageEnglish
Pages (from-to)294-297
Number of pages4
JournalJapanese journal of applied physics
Issue number1 S
Publication statusPublished - 1993 Jan
Externally publishedYes


  • Insulating performance
  • Preoxide
  • Reliability
  • Ultraclean oxidation
  • Very thin oxide

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)


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