Preferred orientation of TiB2 plates prepared by CVD of the TiCl4 + B2H6 system

M. Mukaida, Takashi Goto, T. Hirai

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14 Citations (Scopus)

Abstract

Titanium diboride (TiB2) plates (about 1 mm maximum thickness) were prepared by chemical vapour deposition (CVD) using a TiCl4, B2H6 and H2 system at deposition temperatures, Tdep of 1323-1773 K. The B/Ti atomic ratio in the deposits was 2, and the composition is strictly stoichiometric. Chlorine was not detected. The measured lattice parameters were a=0.3029 nm and c=0.3229 nm. Density is in close agreement with the theoretical value (4.50 g cm-3). Preferred orientation of the CVD TiB2 plates varies mainly with total gas pressures, Ptot. At Ptot=4 kPa the (1 0 0) plane and at Ptot=40 kPa the (1 1 0) plane is preferably oriented parallel to the substrates. The effect of Ptot on the preferred orientation is discussed thermodynamically, and explained by supersaturation in the gas phase.

Original languageEnglish
Pages (from-to)6613-6617
Number of pages5
JournalJournal of Materials Science
Volume26
Issue number24
DOIs
Publication statusPublished - 1991 Jan 1

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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