Predoping effects of boron and phosphorous on arsenic diffusion along grain boundaries in polycrystalline silicon investigated by atom probe tomography

Hisashi Takamizawa, Yasuo Shimizu, Koji Inoue, Yasuko Nozawa, Takeshi Toyama, Fumiko Yano, Masao Inoue, Akio Nishida, Yasuyoshi Nagai

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Engineering & Materials Science

Physics & Astronomy