Prediction of abnormal etching profile in high-aspect-ratio via/hole etching using on-wafer monitoring system

Hiroto Ohtake, Seiichi Fukuda, Butsurin Jinnai, Tomohiko Tatsumi, Seiji Samukawa

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

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Physics & Astronomy

Engineering & Materials Science