Prediction of abnormal etching profile in high-aspect-ratio via/hole etching using on-wafer monitoring system

Hiroto Ohtake, Seiichi Fukuda, Butsurin Jinnai, Tomohiko Tatsumi, Seiji Samukawa

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

For the prediction of abnormal etching profiles, an ion trajectory prediction system has recently been developed. In this system, sheath modeling was combined with the on-wafer monitoring technique for accurate prediction. This system revealed that sidewall conductivity strongly affects the charge accumulation and ion trajectory in high-aspect-ratio holes. It was also found that the accumulated charge in adjacent holes is one of the reasons for the generation of twisting profiles according to analysis using the system. We presume that the prediction system is an effective tool for developing nanoscale fabrication.

Original languageEnglish
Article number04DB14
JournalJapanese journal of applied physics
Volume49
Issue number4 PART 2
DOIs
Publication statusPublished - 2010 Apr

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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