Precise patterning of Si O2 -based glass by low-temperature nanoimprint lithography assisted by UV irradiation on both faces using Glasia as a precursor

Motoki Okinaka, Hiroshi Tsushima, Yoshifumi Ichinose, Emi Watanabe, Keiichi Yanagisawa, Kazuhito Tsukagoshi, Yoshinobu Aoyagi

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Engineering & Materials Science

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